发明名称 POLISHING LIQUID COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a polishing liquid composition for a magnetic disc substrate which can prevent abrasion of a polishing pad without worsening scratch and nano projection defects on the substrate surface after polishing.SOLUTION: A polishing liquid composition for aluminum alloy substrate plated Ni-P contains silica particles, acid, and a copolymer having a constitutional unit derived from (meth)acrylic acid or its salt, and a constitutional unit derived from ethylenic unsaturated sulfone acid compound having a hydroxy group or its salt.SELECTED DRAWING: None
申请公布号 JP2016084428(A) 申请公布日期 2016.05.19
申请号 JP20140218644 申请日期 2014.10.27
申请人 KAO CORP 发明人 YAMAGUCHI TETSUSHI
分类号 C09K3/14;B24B37/00;C09G1/02;G11B5/84 主分类号 C09K3/14
代理机构 代理人
主权项
地址