发明名称 CORROSION-RESISTANT FILM FORMATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a corrosion-resistant film structure excellent in adhesion to galvanization, including a barrier coating for blocking a corrosive factor to galvanization, and capable of thinning film thickness of the whole coating, while maintaining corrosion resistance.SOLUTION: A mixed film of zinc, aluminum and a silica compound is formed by baking finish on a substrate material surface to which electroplating of zinc or a zinc alloy is applied, and, as a top coat thereon, polyorganosiloxane thin film obtained by a sol-gel method containing an organic material is hardened and then fired, to thereby form a porous silica coating.SELECTED DRAWING: Figure 1
申请公布号 JP2016084510(A) 申请公布日期 2016.05.19
申请号 JP20140217993 申请日期 2014.10.27
申请人 BBM:KK;MIWA TECH CO LTD;KAIMON:KK;SUZUKI SHOTEN:KK 发明人 AIDA YUICHI;SUZUKI HIROAKI
分类号 C23C28/00;B32B9/00;B32B15/04;C23C22/53;C23C22/74;F16B33/06 主分类号 C23C28/00
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