发明名称 GALLIUM NITRIDE POWER SEMICONDUCTOR DEVICE HAVING A VERTICAL STRUCTURE
摘要 A semiconductor device includes a substrate having first and second sides and a first active layer disposed over the first side of the substrate. A second active layer is disposed on the first active layer. The second active layer has a higher bandgap than the first active layer such that a two-dimensional electron gas layer arises between the first active layer and the second active layer. At least one trench extends through the first and second active layers and the two-dimensional electron gas layer and into the substrate. A conductive material lines the trench. A first electrode is disposed on the second active layer and a second electrode is disposed on the second side of the substrate.
申请公布号 EP3020070(A1) 申请公布日期 2016.05.18
申请号 EP20140823270 申请日期 2014.06.18
申请人 VISHAY GENERAL SEMICONDUCTOR LLC 发明人 CHEN, MAX SK;LIN, YIH-YIN
分类号 H01L29/205;H01L29/20;H01L29/417;H01L29/778;H01L29/872 主分类号 H01L29/205
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