DEVICE FOR PURIFYING EXHUASTED GAS FROM CHEMICAL VAPOR DEPOSITION

摘要

The present invention relates to an apparatus for purifying waste gas to remove byproducts of combusted gas produced when combusting contaminants such as perfluorinated compounds (PFCs) produced in a process of washing a chemical vapor deposition (CVD) reactor. The apparatus includes a combustion processing unit, a cooling unit, a first purification processing unit, and a liquid tank. The combustion processing unit has an inlet port through which the waste gas containing the contaminant is introduced. The cooling unit includes a first spray nozzle provided at a lower end of the combustion processing unit to spray liquid to purify combusted gas and an open member provided at the center thereof. The outer surface of the open member is closed. The first purification processing unit is provided at a lower end of the cooling unit and includes a wet packing column provided in a portion of an internal space thereof and a gas discharge port provided at one side thereof to pass through the wet packing column. The liquid tank is provided at a lower end of the first purification processing unit. An installation space can be minimized due to a compact structure; the production amount of waste water can be reduced; and the efficiency of disposing of the contaminant can be improved.