| 摘要 |
PROBLEM TO BE SOLVED: To provide a wall flow type exhaust gas purification device capable of improving an exhaust gas purification performance while reducing a pressure loss.SOLUTION: An exhaust gas purification device comprises: a substrate of a wall flow structure having an entry-side cell, an exit-side cell and a porous partition wall 16; a first catalyst part 20 formed in small pores 18a having a relatively small pore size among the internal pores of the partition wall 16; and a second catalyst part 30 formed in large pores 18b having a relatively large pore size among the internal pores of the partition wall 16. The first catalyst part 20 contains a carrier and one or two kinds of noble metals selected from Pt, Pd and Rh supported by the carrier, and the second catalyst part 30 contains the carrier, and one or two kinds of noble metals selected from Pt, Pd and Rh supported by the carrier, other than the noble metals at least included in the first catalyst part 20.SELECTED DRAWING: Figure 4 |
