发明名称 |
SYSTEM AND METHOD FOR AUTOMATICALLY DETECTING A MURA DEFECT USING MASK FILTERING IN WAVELET TRANSFORM |
摘要 |
The present invention relates to a system and a method to automatically detect a stain defect by using mask filtering in wavelet conversion. The system includes: an image obtaining part obtaining an original image of an object; an image processing part including a background image generating part, generating a background image by using a discrete cosine transform (DCT) coefficient, and a wavelet conversion part generating a wavelet detail coefficient and a wavelet approximation coefficient by removing the background image component from the original image and applying wavelet conversion; and an image analyzing part including a stain mask generating part, generating a stain mask by using a standard deviation of the wavelet approximation coefficient, and a mask filtering part emphasizing a stain by applying mask filtering to the wavelet detail coefficient. Therefore, the present invention is capable of effectively detecting a stain defect having a small contrast difference with a background area. |
申请公布号 |
KR20160054151(A) |
申请公布日期 |
2016.05.16 |
申请号 |
KR20140153070 |
申请日期 |
2014.11.05 |
申请人 |
HANBAT NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION |
发明人 |
LEE, SEUNG HO;PARK, JONG SEUNG |
分类号 |
G01N21/88;G01N21/958;G06T7/00 |
主分类号 |
G01N21/88 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|