发明名称 SYSTEM AND METHOD FOR AUTOMATICALLY DETECTING A MURA DEFECT USING MASK FILTERING IN WAVELET TRANSFORM
摘要 The present invention relates to a system and a method to automatically detect a stain defect by using mask filtering in wavelet conversion. The system includes: an image obtaining part obtaining an original image of an object; an image processing part including a background image generating part, generating a background image by using a discrete cosine transform (DCT) coefficient, and a wavelet conversion part generating a wavelet detail coefficient and a wavelet approximation coefficient by removing the background image component from the original image and applying wavelet conversion; and an image analyzing part including a stain mask generating part, generating a stain mask by using a standard deviation of the wavelet approximation coefficient, and a mask filtering part emphasizing a stain by applying mask filtering to the wavelet detail coefficient. Therefore, the present invention is capable of effectively detecting a stain defect having a small contrast difference with a background area.
申请公布号 KR20160054151(A) 申请公布日期 2016.05.16
申请号 KR20140153070 申请日期 2014.11.05
申请人 HANBAT NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION 发明人 LEE, SEUNG HO;PARK, JONG SEUNG
分类号 G01N21/88;G01N21/958;G06T7/00 主分类号 G01N21/88
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