发明名称 |
COA SUBSTRATE AND LIQUID CRYSTAL DISPLAY PANEL |
摘要 |
A COA substrate is provided including a substrate base, a first metal layer, a first insulating layer, a semiconductor layer, a second metal layer, a color resist layer, and a pixel electrode layer. The surface of the color resist layer is provided with a protrusion and a recess, and the pixel electrode is disposed on the protrusion and the recess. A plurality of protrusions and a plurality of recesses are provided, thereby increasing the display quality of a liquid crystal display device. |
申请公布号 |
US2016131930(A1) |
申请公布日期 |
2016.05.12 |
申请号 |
US201414411919 |
申请日期 |
2014.11.19 |
申请人 |
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO. LTD. |
发明人 |
Sun Bo;Zou XiaoLing |
分类号 |
G02F1/1368;H01L29/786;H01L27/12;G02F1/1362;G02F1/1333 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
1. A COA substrate, comprising:
a substrate base; a first metal layer disposed on the substrate base for forming a scan line and a gate region of a thin film field effect transistor; a first insulating layer disposed on the first metal layer; a semiconductor layer disposed on the first insulating layer for forming a channel of the thin film field effect transistor; a second metal layer disposed on the semiconductor layer for forming a source region of the thin film field effect transistor, a drain region of the thin film field effect transistor, and a data line; a color resist layer disposed on the second metal layer and the first insulating layer for forming a color filter; and a pixel electrode layer disposed on the color resist layer and connected with the drain region of the thin film field effect transistor via through-holes of the color resist layer for forming a pixel electrode; wherein a surface of the color resist layer is provided with at least one protrusion and at least one recess, and the pixel electrode is disposed on the protrusion and the recess; the pixel electrode corresponding to each pixel is an integrated pixel electrode which is correspondingly disposed on the color resist layer; wherein the color resist layer is patterned by using a half-tone mask to form the protrusion and the recess on the surface of the color resist layer. |
地址 |
Shenzhen CN |