发明名称 |
INTEGRATED CIRCUIT STRUCTURES WITH SPIN TORQUE TRANSFER MAGNETIC RANDOM ACCESS MEMORY HAVING INCREASED MEMORY CELL DENSITY AND METHODS FOR FABRICATING THE SAME |
摘要 |
STT-MRAM integrated circuit and method for fabricating the same are disclosed. An integrated circuit includes a word line layer, a bit line layer, and an MRAM stack in contact with the bit line metal layer. The integrated circuit further includes a first doped silicon layer in contact with the MRAM stack, the first doped silicon layer including conductivity-determining ions of a first type, and a second doped silicon layer in contact with the first doped silicon layer and further in contact with the word line layer, the second doped silicon layer including conductivity-determining ions of a second type that is opposite the first type. Still further, the integrated circuit includes a third doped silicon layer in contact with the second doped silicon layer and a source line layer in electrical contact with the third doped silicon layer. |
申请公布号 |
US2016133669(A1) |
申请公布日期 |
2016.05.12 |
申请号 |
US201414537966 |
申请日期 |
2014.11.11 |
申请人 |
GLOBALFOUNDRIES Singapore Pte. Ltd. |
发明人 |
Toh Eng Huat;Tran Xuan Anh;Quek Elgin Kiok Boone |
分类号 |
H01L27/22;H01L43/08;H01L43/12;H01L43/02 |
主分类号 |
H01L27/22 |
代理机构 |
|
代理人 |
|
主权项 |
1. An integrated circuit comprising:
a word line layer; a bit line layer; a magnetic random access memory (MRAM) stack in contact with the bit line metal layer; a first doped silicon layer in contact with the MRAM stack, the first doped silicon layer comprising conductivity-determining ions of a first type; a second doped silicon layer in contact with the first doped silicon layer and further in contact with the word line layer, the second doped silicon layer comprising conductivity-determining ions of a second type that is opposite the first type; a third doped silicon layer in contact with the second doped silicon layer; and a source line layer in electrical contact with the third doped silicon layer. |
地址 |
Singapore SG |