发明名称 INTEGRATED CIRCUIT STRUCTURES WITH SPIN TORQUE TRANSFER MAGNETIC RANDOM ACCESS MEMORY HAVING INCREASED MEMORY CELL DENSITY AND METHODS FOR FABRICATING THE SAME
摘要 STT-MRAM integrated circuit and method for fabricating the same are disclosed. An integrated circuit includes a word line layer, a bit line layer, and an MRAM stack in contact with the bit line metal layer. The integrated circuit further includes a first doped silicon layer in contact with the MRAM stack, the first doped silicon layer including conductivity-determining ions of a first type, and a second doped silicon layer in contact with the first doped silicon layer and further in contact with the word line layer, the second doped silicon layer including conductivity-determining ions of a second type that is opposite the first type. Still further, the integrated circuit includes a third doped silicon layer in contact with the second doped silicon layer and a source line layer in electrical contact with the third doped silicon layer.
申请公布号 US2016133669(A1) 申请公布日期 2016.05.12
申请号 US201414537966 申请日期 2014.11.11
申请人 GLOBALFOUNDRIES Singapore Pte. Ltd. 发明人 Toh Eng Huat;Tran Xuan Anh;Quek Elgin Kiok Boone
分类号 H01L27/22;H01L43/08;H01L43/12;H01L43/02 主分类号 H01L27/22
代理机构 代理人
主权项 1. An integrated circuit comprising: a word line layer; a bit line layer; a magnetic random access memory (MRAM) stack in contact with the bit line metal layer; a first doped silicon layer in contact with the MRAM stack, the first doped silicon layer comprising conductivity-determining ions of a first type; a second doped silicon layer in contact with the first doped silicon layer and further in contact with the word line layer, the second doped silicon layer comprising conductivity-determining ions of a second type that is opposite the first type; a third doped silicon layer in contact with the second doped silicon layer; and a source line layer in electrical contact with the third doped silicon layer.
地址 Singapore SG