| 摘要 |
The invention relates to a metal oxide thin film comprising ²-MoO3 comprising at least one doping element of the group Re, Mn, and Ru. Further, the invention relates to a method of producing such a metal oxide thin film via sputtering and a thin film device comprising a metal oxide thin film comprising ²-MoO3 comprising at least one doping element of the group Re, Mn, and Ru. |
