| 摘要 |
A polishing device (1) includes a processing vessel (10) into which workpieces are charged, a fluidizing unit that fluidizes the workpieces in the processing vessel, an abrasive-feeding unit (30) that feeds an abrasive into the workpieces, and a suction unit (40) that generates an air flow in a direction in which the abrasive passes through the processing vessel (10), and recovers the abrasive by suction. The abrasive fed from the abrasive-feeding unit (30) is allowed to pass between the workpieces charged into the processing vessel (10) by the air flow generated from the suction unit (40) while coming into contact with the workpieces. Accordingly, the workpieces are polished. |
