发明名称 PREPARATION METHOD OF REUSE SPUTTERING TARGET AND REUSE SPUTTERING TARGET PREPARED THEREBY
摘要 The present invention relates to a method to manufacture a reused sputtering target, and a reused sputtering target manufactured thereof. The method to manufacture the reused sputtering target comprises: (a) a step of obtaining a first sintered body and a second sintered body by separating backing plates from a first waste target and a second waste target, respectively; (b) a step of cutting the first sintered body and the second sintered body, respectively; (c) a step of inputting the first sintered body and the second sintered body, which have been cut, into a pressing furnace to be opposite each other and pressing the first sintered body and the second sintered body; (d) a step of obtaining a third sintered body where the first sintered body and the second sintered body are bonded by performing thermal treatment to the first sintered body and the second sintered body which are pressed; and (e) a step of coupling the backing plates to the third sintered body. According to the present invention, the manufacturing costs of the sputtering target is able to be saved.
申请公布号 KR20160051578(A) 申请公布日期 2016.05.11
申请号 KR20150121432 申请日期 2015.08.28
申请人 HEE SUNG METAL LTD. 发明人 KWON, OH JIB;HONG, GIL SOO;YANG, SEUNG HO;YOON, WON KYU
分类号 C23C14/34;B22F3/12;B22F8/00;H01L21/02 主分类号 C23C14/34
代理机构 代理人
主权项
地址