| 摘要 |
The pressure variation of a liquid processing unit during a gas exhaust switching operation may be suppressed. According to an embodiment, a substrate liquid processing apparatus comprises a liquid processing unit, an exhaust pipe, a plurality of individual exhaust pipes, and an exhaust switching unit. The liquid processing unit is configured to process a substrate with multiple kinds of processing liquids. The exhaust pipe is connected to the liquid processing unit, and is configured to allow an exhaust gas from the liquid processing unit to flow therein. The plurality of individual exhaust pipes correspond to at least one of the multiple kinds of processing liquids. The exhaust switching unit comprises an exhaust gas inlet chamber and a plurality of switching mechanisms. The exhaust gas inlet chamber has the exhaust gas from the exhaust pipe introduced thereinto. The plurality of switching mechanisms are provided for the exhaust pipes, respectively, and each comprise an exhaust gas suction opening communicating with the exhaust gas inlet chamber, an outlet opening communicating with a corresponding one of the individual exhaust pipes, an exterior air suction opening for introducing exterior air, and a valve body configured to switch a communication state of the exhaust gas suction opening, the outlet opening and the exterior air suction opening between a state where the exhaust gas suction opening communicates with the outlet opening and a state where the exterior air suction opening communicates with the outlet opening. |
