发明名称 |
Multi-patterning system and method using pre-coloring or locked patterns |
摘要 |
A non-transitory, computer readable storage medium is encoded with computer program instructions, such that, when the computer program instructions are executed by a computer, the computer performs a method. The method generates mask assignment information for forming a plurality of patterns on a layer of an integrated circuit (IC) by multipatterning. The mask assignment information includes, for each of the plurality of patterns, a mask assignment identifying which of a plurality of masks is to be used to form that pattern, and a mask assignment lock state for that pattern. User inputs setting the mask assignment of at least one of the plurality of patterns, and its mask assignment lock state are received. A new mask assignment is generated for each of the plurality of patterns having an “unlocked” mask assignment lock state. |
申请公布号 |
US9335624(B2) |
申请公布日期 |
2016.05.10 |
申请号 |
US201414277108 |
申请日期 |
2014.05.14 |
申请人 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
发明人 |
Lee Hui Yu;Chang Chi-Wen;Yang Chih Ming;Liu Ya Yun;Cheng Yi-Kan |
分类号 |
G06F17/50;G03F1/00 |
主分类号 |
G06F17/50 |
代理机构 |
Duane Morris LLP |
代理人 |
Duane Morris LLP ;Koffs Steven E. |
主权项 |
1. A method comprising:
generating mask assignment information for forming a plurality of patterns on a layer of an integrated circuit (IC) by multipatterning, the mask assignment information including, for each of the plurality of patterns, a mask assignment identifying which of a plurality of masks is to be used to form that pattern, and a mask assignment lock state for that pattern; receiving user inputs setting the mask assignment of at least one of the plurality of patterns, and at least one mask assignment lock state of at least one pattern having a respective mask assignment, including allowing the user to set a mask assignment lock state of a pattern having a mask assignment to a locked state and allowing the user to set the mask assignment lock state of the pattern having the mask assignment to an unlocked state; and generating a new mask assignment for each of the plurality of patterns having an “unlocked” mask assignment lock state. |
地址 |
Hsin-Chu TW |