发明名称 PATTERNING METHOD AND PATTERNING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a patterning method and a patterning device suitable for miniaturization of wiring pattern, and improving the use efficiency of a material forming the wiring, when forming a conductive wiring pattern.SOLUTION: A liquid repellent layer 110 is formed by coating the surface of a substrate 100 with process liquid containing a surface modifier for modifying from liquid repellency to lyophilic by light energy. The liquid repellent layer 110 is irradiated with light energy corresponding to the wiring pattern. As a result, a region irradiated with light energy is modified from liquid repellency to lyophilic, and some components produced by modification evaporate, and a modified groove 120 is formed in a region corresponding to the wiring pattern. A wiring pattern can be formed by supplying a metal ink 130 to the groove 120.SELECTED DRAWING: Figure 6
申请公布号 JP2016072436(A) 申请公布日期 2016.05.09
申请号 JP20140200552 申请日期 2014.09.30
申请人 SCREEN HOLDINGS CO LTD 发明人 YANE TAKESHI
分类号 H05K3/10;G03F7/004;G03F7/20;H05K3/12;H05K3/22 主分类号 H05K3/10
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