| 摘要 |
PROBLEM TO BE SOLVED: To provide an excellent photomask which is advantageously adapted to an exposure environment of a mask for manufacturing a display device and in which a fine pattern can be stably transferred, and a manufacturing method thereof.SOLUTION: A photomask comprises a pattern for transfer which is formed on a transparent substrate, in which the pattern for transfer has: a main pattern having a diameter W1(μm); an auxiliary pattern having a width d(μm) which is arranged in the vicinity of the main pattern; and a low light-transmitting part which is arranged in a region other than an area where the main pattern and the auxiliary pattern are formed, a phase difference between the representative wavelengths transmitting through the main pattern and the auxiliary pattern is approximately 180 degrees, the diameter W1, the width d, transmittance T1(%) of the auxiliary pattern, transmittance T3(%) of the low light-transmitting part, and a distance P(μm) between the center of the main pattern and the center of the auxiliary pattern in a width direction have a predetermined relationship.SELECTED DRAWING: Figure 1 |
