METHOD OF MANUFACTURING SUBSTRATE, METHOD OF MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTION FILM, METHOD OF MANUFACTURING MASK BLANK, AND METHOD OF MANUFACTURING TRANSFER MASK

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate capable of manufacturing a substrate of low defect and high smoothness, and to provide a method of manufacturing a substrate with a multilayer reflection film, a method of manufacturing a mask blank, and a method of manufacturing a transfer mask.SOLUTION: For a substrate composed of a material containing an oxide, the processing reference surface of a catalyst material and the principal surface are brought into contact or approached, while interposing the process fluid, and catalyst reference etching of the principal surface is performed by moving the principal surface and processing reference surface relatively. The process fluid contains an organic alkaline aqueous solution.SELECTED DRAWING: Figure 4