发明名称 ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION AND USE THEREOF
摘要 PROBLEM TO BE SOLVED: To provide an alkali-soluble resin, a photosensitive resin composition and a use thereof, in which stability with time can be achieved by suppressing a crosslinking reaction of a hydrolyzable silyl group.SOLUTION: The alkali-soluble resin comprises the following copolymer dissolved in a solvent: the copolymer contains a polymerization unit including a carboxyl group derived from an unsaturated carboxylic acid or the like and a polymerization unit including an alkoxysilyl group derived from a monomer of formula (1) X-(CH)-Si(OR)(CH). The solvent is a specific alcohol having a linear or branched chain with 4 or 5 carbon atoms in an alkyl group. The specific alcohol is preferably a primary alcohol having 4 carbon atoms in an alkyl group, and particularly 1-butanol is preferable. In formula (1), X represents a vinyl group, a styryl group, or a (meth)acryloyl group; R represents a methyl group or an ethyl group; a represents an integer of 0 to 3; and b represents an integer of 1 to 3.SELECTED DRAWING: None
申请公布号 JP2016069400(A) 申请公布日期 2016.05.09
申请号 JP20140196958 申请日期 2014.09.26
申请人 NATOKO KK 发明人 KUZAWA MASAYOSHI;FUKATSU YUTA;IIDA HIROO
分类号 C08F246/00;C08F230/08;C08L101/10;G03F7/075 主分类号 C08F246/00
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