发明名称 |
Thin film processing equipment and the processing method thereof |
摘要 |
This invention discloses a thin film process equipment for depositing a film on a substrate and a process of forming the film using the same. The thin film process apparatus comprises a reaction chamber, a gas supplying mechanism, and a transferring mechanism. The film processing equipment is characterized in that the gas supplying mechanism is formed by a plurality of gas supplying ports in form of the concentric-circle structure for spraying down different kinds of gas, so that the mixing of different kinds of gas become uniform, thus facilitate the gas reaction and the formation of films. |
申请公布号 |
EP2570512(B1) |
申请公布日期 |
2016.05.04 |
申请号 |
EP20110192247 |
申请日期 |
2011.12.06 |
申请人 |
KERN ENERGY ENTERPRISE CO., LTD.;YOSHIMURA, TOSHIAKI |
发明人 |
YOSHIMURA, TOSHIAKI;HSIAO, YING-SHIH |
分类号 |
C23C16/455 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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