发明名称 LPP EUV LIGHT SOURCE DRIVE LASER SYSTEM
摘要 A laser produced plasma EUV system comprising: a drive laser producing a drive laser beam (172); a drive laser beam first path having a first axis; a driver laser redirecting mechanism (170) transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element (30) having a centrally located aperture; a focusing mirror (180) in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site (28) located along the second axis.
申请公布号 EP2488002(B1) 申请公布日期 2016.05.04
申请号 EP20120158455 申请日期 2006.06.27
申请人 ASML NETHERLANDS B.V. 发明人 KHODYKIN, OLEH;BYKANOV, ALEXANDER, N.;FOMENKOV, IGOR, V.;ERSHOV, ALEXANDER, I.
分类号 H05G2/00 主分类号 H05G2/00
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