A laser produced plasma EUV system comprising: a drive laser producing a drive laser beam (172); a drive laser beam first path having a first axis; a driver laser redirecting mechanism (170) transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element (30) having a centrally located aperture; a focusing mirror (180) in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site (28) located along the second axis.
申请公布号
EP2488002(B1)
申请公布日期
2016.05.04
申请号
EP20120158455
申请日期
2006.06.27
申请人
ASML NETHERLANDS B.V.
发明人
KHODYKIN, OLEH;BYKANOV, ALEXANDER, N.;FOMENKOV, IGOR, V.;ERSHOV, ALEXANDER, I.