Apparatus for metering granular source material in a thin film vapor deposition apparatus

摘要

A metering mechanism (200) is configured for transferring measured doses of a granular material from a first location (100) to a second location (60), and is particularly suited for metering source material in a vapor deposition apparatus (60). A receiver is disposed to receive the granular material from the first location (100). A discharge port is axially offset from an outlet of the receiver. A reciprocating delivery member having a passage defined therethrough is moved in a reciprocating path by a controllable drive device between a load position wherein the passage is aligned with the receiver outlet and a discharge position wherein the passage is aligned with the discharge port. The amount of granular material transferred from the first location (100) to the second location (60) is a function of the volume of the passage and the reciprocating rate of the delivery member.