| 发明名称 | Robot and adaptive placement system and method | ||
| 摘要 | An apparatus including at least one processor; and at least one non-transitory memory including computer program code, the at least one memory and the computer program code configured to, with the at least one processor, cause the apparatus to: determine locations of at least two substrates on respective end effectors of the apparatus while the substrates are being moved by the end effectors in substantial unison towards respective target locations for the substrates; and while the end effectors are being moved towards the respective target locations, and based upon the determined locations of the substrates, adjust a position of at least a first one of the end effectors on the apparatus relative to a second one of the end effectors, where the position of the first end effector is adjusted relative to the second end effector while the apparatus is moving the substrates in substantial unison towards the respective target locations and prior to reaching the target locations. | ||
| 申请公布号 | US9330951(B2) | 申请公布日期 | 2016.05.03 |
| 申请号 | US201414295466 | 申请日期 | 2014.06.04 |
| 申请人 | Persimmon Technologies, Corp. | 发明人 | Hosek Martin;Hofmeister Christopher |
| 分类号 | H01L21/68;B25J9/16;H01L21/677 | 主分类号 | H01L21/68 |
| 代理机构 | Harrington & Smith | 代理人 | Harrington & Smith |
| 主权项 | 1. An apparatus comprising: at least one processor; and and at least one non-transitory memory including computer program code, the at least one non-transitory memory and the computer program code configured to, with the at least one processor, cause the apparatus to: determine locations of at least two substrates on respective end effectors of the apparatus while the at least two substrates are being moved by the end effectors in substantial unison towards respective target locations for the at least two substrates; andwhile the end effectors are being moved towards the respective target locations, and based upon the determined locations of the at least two substrates, adjust a position of at least a first one of the end effectors on the apparatus relative to a second one of the end effectors, where the position of the first end effector is adjusted relative to the second end effector while the apparatus is moving the at least two substrates in substantial unison towards the respective target locations and prior to reaching the target locations. | ||
| 地址 | Wakefield MA US | ||