| 发明名称 | Multilayer mirror | ||
| 摘要 | There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon. | ||
| 申请公布号 | US9329503(B2) | 申请公布日期 | 2016.05.03 |
| 申请号 | US201113698171 | 申请日期 | 2011.04.06 |
| 申请人 | ASML Netherlands B.V. | 发明人 | Timoshkov Vadim Iourievich;van Schoot Jan Bernard Plechelmus;Kempen Antonius Theodorus Wilhelmus;Yakunin Andrei Mikhailovich;Osorio Oliveros Edgar Alberto |
| 分类号 | G03B27/70;G03F7/20;B82Y10/00;C23C14/48;C23C14/58;G21K1/06 | 主分类号 | G03B27/70 |
| 代理机构 | Sterne, Kessler, Goldstein & Fox P.L.L.C. | 代理人 | Sterne, Kessler, Goldstein & Fox P.L.L.C. |
| 主权项 | 1. A multilayer mirror comprising: a layer of a first material; a layer of silicon; the layer of the first material and the layer of silicon forming a stack of layers; wherein only an exposed region of the layer of silicon comprises a modification that is arranged to improve robustness of the exposed region of the layer of the silicon. | ||
| 地址 | Veldhoven NL | ||