发明名称 |
3-dimensional (3D) non-volatile memory device and method of fabricating the same |
摘要 |
Provided are 3D non-volatile memory devices and methods of fabricating the same. A 3D non-volatile memory device according to an embodiment of the present invention includes a plurality of conductive lines, which are separated from one another in parallel; a plurality of conductive planes, which extend across the plurality of conductive lines and are separated from one another in parallel; and non-volatile data storage layer patterns, which are respectively arranged at regions of intersection at which the plurality of conductive lines and the plurality of conductive planes cross each others. |
申请公布号 |
US9331272(B2) |
申请公布日期 |
2016.05.03 |
申请号 |
US201214125198 |
申请日期 |
2012.06.11 |
申请人 |
SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION |
发明人 |
Hwang Cheol Seong;Seok Jun Yeong |
分类号 |
H01L29/02;H01L45/00;H01L27/06;H01L27/10;H01L27/24;H01L43/02;H01L43/12;H01L27/22 |
主分类号 |
H01L29/02 |
代理机构 |
Ladas & Parry LLP |
代理人 |
Ladas & Parry LLP |
主权项 |
1. A 3D non-volatile memory device comprising:
a plurality of conductive lines separated from one another in parallel; a plurality of conductive planes extending across the plurality of conductive lines and are separated from one another in parallel; non-volatile data storage layer patterns, each arranged at regions of intersection at which the plurality of conductive lines and the plurality of conductive planes cross each others; and selection diode layer patterns connected to the non-volatile data storage layer pattern in series by stacking the selection diode layer pattern and the non-volatile data storage layer pattern on each other, between the regions of intersection, wherein at least one of the non-volatile data storage layer patterns and the selection diode layer patterns surround the plurality of conductive lines. |
地址 |
Seoul KR |