发明名称 |
CONDUCTIVE FILM COATED SUBSTRATE, MULTILAYER REFLECTIVEFILM COATED SUBSTRATE, REFLECTIVE MASK BLANK, REFLECTIVEMASK, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
Provided is a conductive film coated substrate, including a conductive film formed thereon. In a relationship between a bearing area (%) and a bearing depth (nm) that are obtained by measuring, with an atomic force microscope, a region of 1 μm×1 μm of a surface of the conductive film, the surface of the conductive film satisfies a relationship that (BA70−BA30)/(BD70−BD30) is 15 or more and 260 or less (%/nm), and a maximum height (Rmax) is 1.3 nm or more and 15 nm or less. |
申请公布号 |
SG11201509897W(A) |
申请公布日期 |
2016.04.28 |
申请号 |
SG11201509897W |
申请日期 |
2014.09.22 |
申请人 |
HOYA CORPORATION |
发明人 |
HAMAMOTO, KAZUHIRO;USUI, YOICHI |
分类号 |
H01L21/027;G03F1/24 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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