SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a device and a method for cleaning substrate capable of favorably cleaning a substrate even in such a state that feeding of a processing liquid or the rotation of a brush is not performed.SOLUTION: A substrate cleaning device comprises: a plurality of conveyance shafts 4 having plural conveyance rollers 5 for conveying a substrate W; the brushes 11 cleaning the surface of the substrate W by contacting while rotating; a cleaning liquid nozzle 13 capable of feeding a cleaning liquid L to the brushes 11; and a control part 20 controlling the rotation speed of the brush 11 to become lower than that when performing a cleaning treatment while feeding the cleaning liquid L from the cleaning liquid nozzle 13 before the substrate W reaches the cleaning position by the brushes 11.SELECTED DRAWING: Figure 2