| 摘要 |
PROBLEM TO BE SOLVED: To provide a compound, a resin, and a resist composition which allow resist patterns with excellent preservation stability (defects and resolution) to be produced.SOLUTION: The present invention provides a compound, a resin, and a resist composition represented by the formula (I), where Rrepresents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom; Rrepresents a C1 to C12 fluorinated saturated hydrocarbon group; Wrepresents a C5 to C18 divalent alicyclic hydrocarbon group; Aand Aindependently represent a single bond or-A-X-(A-X)-; Aand Aindependently represent a C1 to C6 alkanediyl group; Xand Xindependently represent -O-, -CO-O- or -O-CO-; a represents 0 or 1; and * represents a bond to an oxygen atom.SELECTED DRAWING: None |
