| 摘要 |
The invention relates to a device for handling process gases in a plasma stimulated by electromagnetic waves, comprising a plasma chamber, which is lined by a dielectric, a generator for generating the electromagnetic waves and a waveguide assembly for feeding the electromagnetic waves into the plasma chamber, wherein the waveguide assembly has at least two feed points, each having an electric field waveguide branch, for feeding the electromagnetic waves as continuous waves into the dielectric. |
