发明名称 液浸上層膜形成用組成物及びレジストパターン形成方法
摘要 A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R1 represents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 represents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof —CO—, —COO—, —O—, —NR′—, —CS—, —S—, —SO—, —SO2— or a combination thereof; and R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.
申请公布号 JP5910445(B2) 申请公布日期 2016.04.27
申请号 JP20120218885 申请日期 2012.09.28
申请人 JSR株式会社 发明人 峯岸 信也;田中 希佳;草開 一憲
分类号 G03F7/11;H01L21/027 主分类号 G03F7/11
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