发明名称 液処理装置
摘要 PROBLEM TO BE SOLVED: To provide a liquid processing apparatus capable of preventing a liquid from leaking out of a supply part supplying the liquid to a substrate.SOLUTION: A liquid processing apparatus comprises: a substrate holding part for holding a substrate to be subjected to liquid processing; supply means for supplying a prescribed liquid to the substrate held by the substrate holding part; a supply tube for supplying the liquid from a liquid supply part to the supply means; a supply valve provided in the supply tube, for starting supply of the liquid or stopping the supply; a speed control unit provided at the supply valve, for controlling an opening/closing speed of the supply valve; a drain tube branched from the supply tube on a side of the liquid supply part from the supply valve, for draining the liquid flowing in the supply tube; and a first on-off valve provided in the drain tube. The liquid supply part includes: a plurality of tubes supplying a plurality of kinds of liquids, respectively; and a third on-off valve provided corresponding to the plurality of tubes and selectively supplying the plurality of kinds of liquids to the supply tube. The liquid processing apparatus further includes a flow controller provided between the third on-off valve and the supply valve in the supply tube.
申请公布号 JP5913492(B2) 申请公布日期 2016.04.27
申请号 JP20140181295 申请日期 2014.09.05
申请人 東京エレクトロン株式会社 发明人 伊藤 規宏
分类号 H01L21/304;H01L21/306 主分类号 H01L21/304
代理机构 代理人
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