发明名称 Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
摘要 A fine movement stage is driven by a controller, based on positional information of the fine movement stage in a measurement direction measured by a measurement system and correction information of a measurement error caused by a tilt of the fine movement stage included in the positional information. Accordingly, driving the fine movement stage with high precision becomes possible, which is not affected by a measurement error included in the positional information in a measurement direction of the measurement system that occurs due to a tilt of the fine movement stage.
申请公布号 US9323162(B2) 申请公布日期 2016.04.26
申请号 US201313973260 申请日期 2013.08.22
申请人 NIKON CORPORATION 发明人 Shibazaki Yuichi
分类号 G03F7/20 主分类号 G03F7/20
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. An exposure apparatus that exposes a substrate with illumination light via a projection optical system, the apparatus comprising: a frame structure that supports the projection optical system; a base member placed under the projection optical system and having a surface placed substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system, wherein the base member is a component of the exposure apparatus that is supported by a floor; a substrate stage that is placed on the base member and holds the substrate, the substrate stage having a holding member and a main body section, the holding member having a mounting area of the substrate provided on an upper surface side and a measurement surface having a grating provided on a lower surface side, and the main body section supporting the holding member so that a space is formed between the measurement surface and the surface of the base member; a drive system having an electromagnetic motor that drives the substrate stage, wherein the electromagnetic motor includes a planar motor that has a stator arranged at the base member; a measurement member coupled to the frame structure, a part of the measurement member being placed under the projection optical system; a measurement system that has a head section arranged at the part of the measurement member and placed lower than the measurement surface and higher than the surface of the base member, and measures positional information of the substrate stage by irradiating the measurement surface with a measurement beam from below via the head section that is placed in the space as the substrate stage is arranged facing the projection optical system; and a controller that is coupled to the drive system and controls drive of the substrate stage by the drive system based on the positional information measured by the measurement system and correction information of a measurement error that occurs in a tilt of the holding member included in the positional information.
地址 Tokyo JP