发明名称 |
Process for the electrochemical deposition of a semiconductor material |
摘要 |
A process for the electrochemical deposition of a semiconductor material, which process comprises: (i) providing a non-aqueous solvent; (ii) providing at least one precursor salt which forms a source of the constituent elements within the semiconductor material to be deposited; and (iii) electrodepositing the semiconductor material onto an electrode substrate using the precursor salt in the non-aqueous solvent, characterized in that: (iv) the semiconductor material is a p-block or a post-transition metal semiconductor material containing at least one p-block element or post-transition metal; and (v) the non-aqueous solvent is a halocarbon non-aqueous solvent. |
申请公布号 |
US9322108(B2) |
申请公布日期 |
2016.04.26 |
申请号 |
US201314392013 |
申请日期 |
2013.07.24 |
申请人 |
University of Southampton |
发明人 |
Reid Gillian;Bartlett Philip Nigel;Hector Andrew Lee |
分类号 |
C25D3/00;C25D3/02;C25D7/12;H01L45/00;C25D5/02;C25D3/34;C25D3/32;C25D3/30;C25D3/26;C25D3/36;C25D3/60;H01L21/02;C25D3/44;C25D3/54;C25D3/56;C25D5/18;C25D9/08 |
主分类号 |
C25D3/00 |
代理机构 |
Iandiorio Teska & Coleman, LLP |
代理人 |
Iandiorio Teska & Coleman, LLP |
主权项 |
1. A process for the electrochemical deposition of a semiconductor material, which process comprises:
(i) providing a non-aqueous solvent; (ii) providing at least one precursor salt which comprises a halometallate anion salt wherein a metal in the halometallate is Al, Ga, In, Ge, Sn, Pb, As, Sb, Bi, Se, Te, Cd or Hg and which forms a source of the constituent elements within the semiconductor material to be deposited; and (iii) electrodepositing the semiconductor material onto an electrode substrate using the precursor salt in the non-aqueous solvent, characterised in that: (iv) the semiconductor material is a p-block or a post-transition metal semiconductor material containing at least one p-block element or post-transition metal; and (v) the non-aqueous solvent is a halocarbon non-aqueous solvent. |
地址 |
Southampton GB |