HEATING APPARATUS FOR CHAMFERING OF GLASS

摘要

The present invention relates to a heating apparatus for glass chamfering. More specifically, the heating apparatus includes a heat emission body and a thermally conductive cover unit which surrounds the heat emission body and has the hardness of 1,000 kg/mm or higher. Accordingly, the heating apparatus prevents abrasion thereof in order to reduce cracks and chips. The heating apparatus prevents direct friction between glass and the heat emission body in order to extend the service life of the heat emission body. The heating apparatus can also enhance processability and reduce the cost of consumables.