发明名称 Liquid crystal display device
摘要 A pixel electrode is formed on a TFT substrate, and a gate insulating film is formed thereon. On the gate insulating film, formed is an inorganic passivation film, on which a common electrode having slits is formed. Through-holes are formed in the gate insulating film at areas where the pixel electrode faces the common electrode, and the pixel electrode is not connected to a source electrode in the through-hole. The through-holes are filled with the inorganic passivation film, and the common electrode is formed on the inorganic passivation film at a position corresponding to each through-hole. The pixel electrode faces the common electrode at the position through not the gate insulating film but only the inorganic passivation film, and thus the pixel capacity can be increased. Accordingly, it is possible to prevent changes in the electric potential of the pixel electrode caused by ON/OFF operations.
申请公布号 US9324287(B2) 申请公布日期 2016.04.26
申请号 US201213719293 申请日期 2012.12.19
申请人 Japan Display Inc. 发明人 Nagami Takahiro
分类号 G09G3/36;G02F1/1335;G02F1/1362;G02F1/1343 主分类号 G09G3/36
代理机构 Typha IP LLC 代理人 Typha IP LLC
主权项 1. A liquid crystal display device comprising: a TFT (thin-film transistor) substrate on which pixels having pixel electrodes and TFTs are formed in a matrix shape; an opposed substrate having color filters; and liquid crystal sandwiched between the TFT substrate and the opposed substrate, wherein a pixel electrode is formed on the TFT substrate, a gate insulating film is formed on the pixel electrode, an inorganic passivation film is formed on the gate insulating film, and a common electrode having slits is formed on the inorganic passivation film; a video signal is supplied to the pixel electrode from a source electrode of a TFT through a first through-hole of the gate insulating film; a second through-hole is formed in the gate insulating film at a position where the pixel electrode faces the common electrode, and the pixel electrode and the source electrode are not connected to each other in the second through-hole; the inorganic passivation film is formed in the second through-hole; and the common electrode is formed on the inorganic passivation film at an area corresponding to the second through-hole.
地址 Tokyo JP