发明名称 FORMING METHOD OF FINE LINE PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a forming method of fine line pattern, in which a line drawing comprising a fine line pattern consisting of very fine uneven fine lines is created on a product so as to exert changing effect in which reflected light from each part of the line drawing is changed when seen from a different angle or direction.SOLUTION: A fine line pattern consisting of a plurality of fine lines with fine line pitch is created on a print film as an uneven ink layer by printing; then the print film is arranged in a cavity of a mold forming a configuration of a product in a manner where an ink layer providing an uneven fine line pattern is directed to the cavity; after clamping the mold, molten resin is introduced into the mold; resin is solidified in a state where the ink layer providing a fine line pattern is made to face a surface of the product in the mold and the print film is adhered thereon; after opening the mold, the product is removed, then the print film arranged in the mold is reused in the next forming, therefore a fine line pattern may be formed on surfaces of a plurality of products with the same print film.SELECTED DRAWING: Figure 1
申请公布号 JP2016060105(A) 申请公布日期 2016.04.25
申请号 JP20140189679 申请日期 2014.09.18
申请人 NAITO PROCESS KK 发明人 NAITO MASAKAZU
分类号 B29C45/26;B41M1/12;B41M3/00;B41M3/14;G09F19/14 主分类号 B29C45/26
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