| 发明名称 |
SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM STORING SUBSTRATE LIQUID PROCESSING PROGRAM |
| 摘要 |
Disclosed is a substrate liquid processing apparatus. The apparatus includes: a pure water supply unit (a rinse liquid supply unit) configured to supply pure water to a substrate; and a drying liquid supply unit configured to supply a drying liquid having a higher volatility than the pure water to the substrate. The substrate liquid processing apparatus is used to supply the drying liquid having the higher volatility, of which a part contains a silicon-based organic compound, to the substrate, from the drying liquid supply unit. |
| 申请公布号 |
US2016111303(A1) |
申请公布日期 |
2016.04.21 |
| 申请号 |
US201514880462 |
申请日期 |
2015.10.12 |
| 申请人 |
Tokyo Electron Limited |
发明人 |
Nakamori Mitsunori;Kitano Junichi;Minami Teruomi |
| 分类号 |
H01L21/67;H01L21/02;B08B3/08 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate liquid processing apparatus comprising:
a pure water supply unit configured to supply pure water to a substrate; and a drying liquid supply unit configured to supply a drying liquid having a higher volatility than the pure water to the substrate, wherein the drying liquid supply unit supplies the drying liquid having the higher volatility, of which a part contains a silicon-based organic compound, to the substrate. |
| 地址 |
Tokyo JP |
