| 摘要 |
PROBLEM TO BE SOLVED: To increase reliability of plasma ignition in a DC sputtering apparatus by using a simple configuration.SOLUTION: When a switching element 41 is in an off-state, a capacitor 44 is charged with a high-voltage small-current auxiliary DC power supply 45. When the switching element 41 is turned on, a high voltage by the auxiliary DC power supply 45 is applied between an anode 10a and a cathode 10b of a chamber 10. When the high-voltage causes ionization of a part of plasma gas in a chamber 10, energy stored in the capacitor 44 is instantly discharged, supplying a large current in the chamber 10. This accelerates plasma generation to cause an ignition. Also after the capacitor 44 completes a discharge, current is supplied to the chamber 10 from the auxiliary DC power supply 45 via a resistor 46 to maintain plasma, reaching a stable plasma state. Because a total energy in the discharge of the capacitor 44 is small, an excess arc discharge hardly occurs, avoiding a damage of a target or a substrate.SELECTED DRAWING: Figure 1 |
