| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a patterned transparent conductive film 10 that facilitates crystallization, can shorten a time of heating process, can make a conveyance speed of a film base material 1 fast, and is efficient.SOLUTION: A method of manufacturing a patterned transparent conductive film 10 comprises the processes of: providing a hard coat layer 2 on a transparent film base material 1; providing a transparent conductive layer 4 on the hard coat layer 2; thermally treating the formed transparent conductive layer 4; and forming wiring by patterning the transparent conductive layer 4 having been thermally treated. In a process of forming a film of ITO as the transparent conductive layer 4 by a sputtering method, water partial pressure in a chamber is 4.5×10Pa or lower and after the film deposition, heating is carried out at a temperature of 160-200°C by a vacuum heating device.SELECTED DRAWING: Figure 1 |
