发明名称 LOW TEMPERATURE POLY-SILICON THIN FILM TRANSISTOR AND MANUFACTURING METHOD, ARRAY SUBSTRATE AND DISPLAY DEVICE
摘要 A low temperature poly-silicon thin film transistor and a manufacturing method, an array substrate and a display device. The manufacturing method for the low temperature poly-silicon thin film transistor comprises: S1: sequentially forming an active layer (3), a gate electrode insulating layer (4), a gate electrode (5) and an interlayer insulating layer (6) on an underlayer substrate (1); S2: forming a first metal thin film layer (8); S3: performing hydrogenation processing on the active layer (3) and the gate electrode insulating layer (4); and S4: forming a second metal thin film layer (7), wherein the second metal thin film layer (7) is used for forming a source electrode and a drain electrode.
申请公布号 WO2016058324(A1) 申请公布日期 2016.04.21
申请号 WO2015CN74489 申请日期 2015.03.18
申请人 BOE TECHNOLOGY GROUP CO., LTD. 发明人 LU, XIAOYONG;LIU, ZHENG;SUN, LIANG;LI, XIAOLONG;LONG, CHUNPING
分类号 H01L21/336;H01L29/786 主分类号 H01L21/336
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