发明名称 |
LOW TEMPERATURE POLY-SILICON THIN FILM TRANSISTOR AND MANUFACTURING METHOD, ARRAY SUBSTRATE AND DISPLAY DEVICE |
摘要 |
A low temperature poly-silicon thin film transistor and a manufacturing method, an array substrate and a display device. The manufacturing method for the low temperature poly-silicon thin film transistor comprises: S1: sequentially forming an active layer (3), a gate electrode insulating layer (4), a gate electrode (5) and an interlayer insulating layer (6) on an underlayer substrate (1); S2: forming a first metal thin film layer (8); S3: performing hydrogenation processing on the active layer (3) and the gate electrode insulating layer (4); and S4: forming a second metal thin film layer (7), wherein the second metal thin film layer (7) is used for forming a source electrode and a drain electrode. |
申请公布号 |
WO2016058324(A1) |
申请公布日期 |
2016.04.21 |
申请号 |
WO2015CN74489 |
申请日期 |
2015.03.18 |
申请人 |
BOE TECHNOLOGY GROUP CO., LTD. |
发明人 |
LU, XIAOYONG;LIU, ZHENG;SUN, LIANG;LI, XIAOLONG;LONG, CHUNPING |
分类号 |
H01L21/336;H01L29/786 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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