发明名称 APPARATUS FOR ADJUSTABLE LIGHT SOURCE
摘要 Apparatus for adjusting the position of lamp modules of a processing chamber are disclosed herein. Implementations generally include a process chamber comprising an enclosure defining an internal volume, a substrate support disposed in the internal volume of the process chamber, and a plurality of adjustable lamp modules. Each adjustable lamp module can include a radiation source, a lamp connector in connection with the radiation source, an adjustable mounting bracket connected to the lamp connector, the adjustable mounting bracket being pivotably connected to the process chamber; and a adjustable force device mounted in connection with the adjustable mounting bracket.
申请公布号 US2016111305(A1) 申请公布日期 2016.04.21
申请号 US201514864261 申请日期 2015.09.24
申请人 Applied Materials, Inc. 发明人 Kumar Navjot;MYO Nyi O.;CHU Schubert S.;GIRIDHAR Kamesh;GAJENDRA Palamurali
分类号 H01L21/67;H05B3/00 主分类号 H01L21/67
代理机构 代理人
主权项 1. An apparatus for processing a semiconductor substrate, comprising: a process chamber comprising an enclosure defining an internal volume; a substrate support disposed in the internal volume of the process chamber; a plurality of radiation emitters; an adjustable bracket comprising a base connected to at least one of the radiation emitters, the adjustable bracket being pivotably connected to the process chamber; and an adjuster connected with the adjustable bracket.
地址 Santa Clara CA US