| 发明名称 |
COMPOSITIONS FOR REMOVING RESIDUES AND RELATED METHODS |
| 摘要 |
Compositions for removing residues from a semiconductor structure. The compositions comprise water, a base, a polydentate chelator, a degasser, and a fluorine source. The compositions comprise greater than or equal to approximately 99 wt % of the water and are formulated to exhibit a pH of from approximately 10.0 to approximately 12.0. Methods of forming and using the compositions are also disclosed. |
| 申请公布号 |
US2016108348(A1) |
申请公布日期 |
2016.04.21 |
| 申请号 |
US201414514656 |
申请日期 |
2014.10.15 |
| 申请人 |
Micron Technology, Inc. |
发明人 |
Franklin Cole S.;Imonigie Jerome A. |
| 分类号 |
C11D11/00;C11D7/32;H01L45/00;C11D7/08;C11D7/26;C11D7/04;C11D7/06 |
主分类号 |
C11D11/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A composition for removing residues from a semiconductor structure, the composition comprising:
water, a base, a polydentate chelator, a degasser, and a fluorine source, the composition comprising greater than or equal to approximately 99 wt % of water and formulated to exhibit a pH of from approximately 10.0 to approximately 12.0. |
| 地址 |
Boise ID US |
