Lithographic apparatus, excimer laser and device manufacturing method

摘要

A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.

主权项

1. A system comprising:
an excimer laser arranged to produce radiation to expose a radiation-sensitive surface of a substrate in a lithographic apparatus; and a bandwidth-control system arranged to control a bandwidth of the spectral distribution of radiant intensity of the radiation, the bandwidth-control system constructed and arranged to adjust the bandwidth, in reaction to a user supplied signal representative for a selected bandwidth of the spectral distribution, to a bandwidth away from a nominal design bandwidth for the lithographic apparatus, wherein the signal is determined based on data relating to a feature in a pattern, the pattern being that of a patterning device used to modulate the radiation for projection onto a radiation-sensitive target portion of the substrate by the lithographic apparatus and the selected bandwidth is arranged to reduce an optical proximity effect in projection of the pattern.