发明名称 |
COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING TITANIUM NITRIDE |
摘要 |
Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., cobalt, ruthenium and copper, and insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant and one etchant, may contain various corrosion inhibitors to ensure selectivity. |
申请公布号 |
EP3004287(A1) |
申请公布日期 |
2016.04.13 |
申请号 |
EP20140807521 |
申请日期 |
2014.06.06 |
申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
CHEN, LI-MIN;LIPPY, STEVEN;COOPER, EMANUEL I.;SONG, LINGYAN |
分类号 |
C09K13/00;G03F7/32 |
主分类号 |
C09K13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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