发明名称 |
Device for inspecting substrate having irregular rough surface and inspection method using same |
摘要 |
A substrate inspection apparatus for inspecting a substrate having an irregular concave-convex surface for scattering lights, comprises a first irradiation system which irradiates the substrate with a first detection light; a first detection system which detects any luminance unevenness from the entire concave-convex surface of the substrate irradiated with the first detection light; a second irradiation system which irradiates the substrate with a second detection light having a wavelength different from that of the first detection light; and a second detection system which detects any defect of the concave-convex surface of the substrate irradiated with the second detection light. The luminance unevenness and a pattern defect of the substrate having the irregular concave-convex surface can be inspected effectively at low cost. |
申请公布号 |
US9310319(B2) |
申请公布日期 |
2016.04.12 |
申请号 |
US201514667159 |
申请日期 |
2015.03.24 |
申请人 |
JX NIPPON OIL & ENERGY CORPORATION |
发明人 |
Sato Yusuke;Nishimura Suzushi |
分类号 |
G01N21/956;G01N21/47;H01L21/66;H01L51/56;G01N21/88;H01L51/52 |
主分类号 |
G01N21/956 |
代理机构 |
Oliff PLC |
代理人 |
Oliff PLC |
主权项 |
1. A substrate inspection apparatus for inspecting a substrate having an irregular concave-convex surface for scattering lights, comprising:
a first irradiation system which irradiates the substrate with a first detection light; a first detection system which detects any luminance unevenness from the entire concave-convex surface of the substrate irradiated with the first detection light; a second irradiation system which irradiates the substrate with a second detection light having a wavelength different from that of the first detection light; and a second detection system which detects a pattern defect of the concave-convex surface of the substrate irradiated with the second detection light. |
地址 |
Tokyo JP |