发明名称 Device for inspecting substrate having irregular rough surface and inspection method using same
摘要 A substrate inspection apparatus for inspecting a substrate having an irregular concave-convex surface for scattering lights, comprises a first irradiation system which irradiates the substrate with a first detection light; a first detection system which detects any luminance unevenness from the entire concave-convex surface of the substrate irradiated with the first detection light; a second irradiation system which irradiates the substrate with a second detection light having a wavelength different from that of the first detection light; and a second detection system which detects any defect of the concave-convex surface of the substrate irradiated with the second detection light. The luminance unevenness and a pattern defect of the substrate having the irregular concave-convex surface can be inspected effectively at low cost.
申请公布号 US9310319(B2) 申请公布日期 2016.04.12
申请号 US201514667159 申请日期 2015.03.24
申请人 JX NIPPON OIL & ENERGY CORPORATION 发明人 Sato Yusuke;Nishimura Suzushi
分类号 G01N21/956;G01N21/47;H01L21/66;H01L51/56;G01N21/88;H01L51/52 主分类号 G01N21/956
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. A substrate inspection apparatus for inspecting a substrate having an irregular concave-convex surface for scattering lights, comprising: a first irradiation system which irradiates the substrate with a first detection light; a first detection system which detects any luminance unevenness from the entire concave-convex surface of the substrate irradiated with the first detection light; a second irradiation system which irradiates the substrate with a second detection light having a wavelength different from that of the first detection light; and a second detection system which detects a pattern defect of the concave-convex surface of the substrate irradiated with the second detection light.
地址 Tokyo JP