VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus and a vapor deposition method, enabling the film thickness of a vapor-deposited film to be measured with higher accuracy and a higher responsibility.SOLUTION: There is provided the vapor deposition apparatus for vapor-depositing a gasified material 8 on the surface of a substrate 4 arranged in a vacuum chamber 1. The vapor deposition apparatus comprises: a vapor deposition source for gasifying a material; optical concentration measuring means 100 for optically measuring the concentration of the material 8 gasified by an evaporation source 3; and a valve 6 for adjusting the flow rate of the gasified material. The optical concentration measuring means 100 is arranged between the valve 6 for adjusting the flow rate and an aperture.SELECTED DRAWING: Figure 1