发明名称 COSMETIC METHOD
摘要 The present invention provides a cosmetic method having an excellent secondary adhesion resistance effect. The cosmetic method of the present invention has a step of applying a cosmetic material on the skin, a step of pasting the base material film surface of a thin film on the skin, and a step of removing the support body of the pasted thin film, wherein the thin film consists of a base material film of the thickness of 10 to 500 nm and a support body.
申请公布号 HK1209634(A1) 申请公布日期 2016.04.08
申请号 HK20150110430 申请日期 2015.10.23
申请人 SHISEIDO COMPANY LTD. 发明人 KIMURA, TOMOKO;KANNO, NAOMI;YAMAKI, SATOSHI
分类号 A61K;A61Q 主分类号 A61K
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