| 摘要 |
The present invention relates to an etchant composition for a silver nanowire, comprising phosphoric acid, nitric acid, acetic acid, and a polyhydric alcohol-type compound. The etchant composition of the present invention prevents readsorption of etched silver ions into an overcoating material, and does not generate residues, while etching a silver nanowire coated with the overcoating material, thereby uniformly etching the silver nanowire inside the overcoating material. |
