PREPARATION METHOD OF PATTERENED SUBSTRATE

摘要

The present invention relates to a method for manufacturing a patterned substrate. The method for manufacturing a patterned substrate can be applied to a manufacturing process, for example, a manufacturing process of a device, such as an electronic device and an integrated circuit, or to other purposes such as manufacturing an integrated optical system, a guidance and a detection pattern for a magnetic domain memory, a flat panel display, a liquid crystal display (LCD), a thin film magnetic head or an organic light emitting diode or the like. In addition, the method for manufacturing a patterned substrate may be used to construct a pattern on a surface used to manufacture a discrete track medium of a magnetic storage device or the like, such as an integrated circuit, a bit-patterned medium and/or a hard drive. The method for manufacturing a patterned substrate comprises a step of forming a film including a block copolymer on a trench formed on a substrate through mesa structures arranged on the surface of the substrate at intervals and inducing a self-assembled structure of the block copolymer.