| 摘要 |
Provided are a small-sized space-saving film forming apparatus that can form a film of a uniform thickness rapidly and efficiently regardless of shape of a work, and a method for manufacturing a film forming substrate. The film forming apparatus includes a chamber (2) into which a sputter gas (G1) is introduced, a transport part (3) installed in the chamber (2) and having a transport passage (P) for transporting the work (W) in a circulative manner, a target (41) formed by a film forming material deposited on the work (W) to be formed into a film and installed at a location opposite to the transport passage (P) to be spaced apart from the transport passage (P), a first power source (5) that deposits the film forming material on the work (W) by applying electric power to the target (41) to covert the sputter gas (G1) into plasma, and a power source control unit (91) that changes electric power applied to the target (41) by the first power source (5) according to a change in the location of the target (41) of the work (W) while the work (W) passes through a film forming area (F) that is an area in which the film forming material is deposited by the transport unit (P). |
