发明名称 DETECTION OF GAS IMPURITIES WITH A GAS CHROMATOGRAPH
摘要 Detection system and method for the measurement of gas impurities in a gas sample with a gas chromatograph. The system comprises a plasma emission detector; a gas chromatograph; a vacuum pump for the plasma emission detector; a moisture permeation device to create moisture and add the moisture to the plasma emission detector by bypassing the gas chromatograph; a microcontroller device to control operation of the detection system, the microcontroller device controlling the pressure of the plasma emission detector using the vacuum pump and the moisture added to the plasma emission detector using the moisture permeation device.
申请公布号 WO2016051357(A1) 申请公布日期 2016.04.07
申请号 WO2015IB57495 申请日期 2015.09.30
申请人 LDETEK INC. 发明人 GAGNÉ, DANY;PARADIS, LOUIS
分类号 G01N30/78 主分类号 G01N30/78
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