| 摘要 |
Provided is gas supply technology that is capable of solving problems, such as hunting, etc. Two first supply units (21a) supply a first constant amount of reactive gas from openings (22a) into a chamber (11). A second supply unit (21b) supplies a second variable amount of reactive gas from an opening (22b) into the chamber (11). During plasma processing, the second amount is controlled through feedback control based on a PEM method. As described above, a sputtering apparatus (10) has the single second supply unit (21b) which performs feedback control of the second amount, and thus a hunting problem attributable to the presence of a plurality of feedback controls is overcome. |
